Positive Photoresist

Product overview

Designed specifically for fine graphics, the exposed area is soluble in developer, making it suitable for a variety of scenes that require high-precision graphics.

Core features
- High Resolution (≤1.5 μm)

- Excellent Adhesion

- Favorable Process Window

- Low‑particle Contamination

- Excellent Stability

Application Fields

- Semiconductor Packaging

- Microelectronic Manufacturing

- MEMS Devices

- Optoelectronic Devices

Product pictures